1. 实验上,我们采用全像微术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片,并量该试片的反射频谱和接触角。
We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating. The performance is evaluated by measuring the reflectance spectrum and contact angle.

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2. 讨论了格上可结构的封闭性以及此结构上落函数的有关问题。
The closeness of measurable structure of lattice and concerned questions of fall shadow function on the structure are discussed in this paper.

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3. 讨论了格上可结构的封闭性以及此结构上落函数的有关问题。
The closeness of measurable structure of lattice and concerned questions of fall shadow function on the structure are discussed in this paper.

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