The fabrication procedure of the mask and results of the deep X ray lithography are given.
youdao
2. 着重介绍了LIGA工艺中X射线光刻掩模的制作步骤和方法。
The paper introduces emphatically the making step and method of X -ray lithograph etching in LIGA technology.
youdao
3. 对利用X射线光刻制作大高宽比硬x射线波带片的设计和制作工艺进行了研究。
The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.
youdao
4. 在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
youdao
5. 描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
youdao
6. 提出了用于提高X射线光刻对准系统自动对准效率和对准精度的图像边缘增强技术，并进行了数值分析。
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system, and the numerical analysis was given.
youdao
7. 提出了用于提高X射线光刻对准系统自动对准效率和对准精度的图像边缘增强技术，并进行了数值分析。
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system, and the numerical analysis was given.
